Secondary ion mass spectrometry: Difference between revisions
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|acronym= | |||
|def=Technique in which a focused beam of primary [[ion]]s produces [[secondary ion]]s by sputtering from a solid surface. The secondary ions are analyzed by [[mass spectrometry]]. | |||
|rel=[[dynamic secondary ion mass spectrometry]] ([[DSIMS]]) | |||
|ref=A. Benninghoven, B. Hagenhoff, E. Niehuis. Anal. Chem. 65, 630A (1993). | |||
}} | }} | ||
== | ==Gallery== | ||
{{gallery|file=File:Ion surface interactions.gif|caption=Overview of various ion-surface interactions. (1)-incoming ion; (2)-scattering; (3)-neutralization and scattering; (4)-sputtering or recoiling; (5)-electron emission; (6)-photon emission; (7)-adsorption; (8)-displacement, e.g. from sputtering event.}} | |||
{{Gallery | |||
|file= | |||
File:SHRIP II.JPG | |||
|caption= | |||
SHRIMP II @ Curtin University, Western Australia | |||
}} | |||
{{Gallery | |||
|file= | |||
File:IMS3F pbmf.JPG | |||
|caption= | |||
CAMECA IMS3f (1980) Magnetic SIMS Instrument | |||
}} | |||
[[Category:Ionization]] | [[Category:Ionization]] | ||
Latest revision as of 11:26, 11 August 2025
| IUPAC RECOMMENDATIONS 2013 |
| Secondary ion mass spectrometry |
|---|
| Technique in which a focused beam of primary ions produces secondary ions by sputtering from a solid surface. The secondary ions are analyzed by mass spectrometry. |
| Related Term(s): dynamic secondary ion mass spectrometry (DSIMS) |
| Reference(s):
A. Benninghoven, B. Hagenhoff, E. Niehuis. Anal. Chem. 65, 630A (1993). |
| From Definitions of Terms Relating to Mass Spectrometry (IUPAC Recommendations 2013); DOI: 10.1351/PAC-REC-06-04-06 © IUPAC 2013. |
Gallery
