Surface-assisted laser desorption ionization: Difference between revisions
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This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. | This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also [[desorption/ionization on silicon]] and [[laser desorption/ionization]]. | ||
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== Related Terms == | |||
*[[MALDI]] | |||
*[[LDI]] | |||
*[[DIOS]] | |||
[[Category:Ionization]] | [[Category:Ionization]] | ||
Revision as of 11:32, 1 December 2005
| DRAFT DEFINITION |
| Surface-assisted laser desorption ionization |
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This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also desorption/ionization on silicon and laser desorption/ionization. |
| Considered between 2004 and 2006 but not included in the 2006 PAC submission |
| This is an unofficial draft definition presented for information and comment. |
