Surface-enhanced laser desorption/ionization: Difference between revisions

Revision as of 01:19, 17 January 2006

Surface-enhanced laser desorption/ionization
DRAFT DEFINITION
The formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also desorption/ionization on silicon and laser desorption/ionization.
Considered between 2004 and 2006 but not included in the 2006 PAC submission
This is an unofficial draft definition presented for information and comment. Recommended terms \| Full list of terms

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 {{DefName|
-This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also [[DIOS|desorption/ionization on silicon]] and [[LDI|laser desorption/ionization]].
+The formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also [[DIOS|desorption/ionization on silicon]] and [[LDI|laser desorption/ionization]].
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